Vacuum magnetron sputtering dabara ne da amfani da mace, bipolar electrode surface tare da Magnetic filin na electron a cikin cathode surface drift, ta hanyar kafa manufa surface lantarki filin perpendicular da Magnetic filin, da electron ƙara bugun jini, ƙara yawan ionization. na gas, yayin da high-makamashi barbashi gas da kuma rasa makamashi bayan karo da kuma haka ƙananan substrate zafin jiki, cikakken shafi a kan wani mara zafin jiki resistant abu.